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Completed TRL 3 (started at 1, targeting 3)
Development of advanced lithography processes using new stepper and electron beam lithography systems. We will develop basic processes and design rules using the new tools with the goal of quickly making this new capability available to new and existing projects.
Advanced lithography to enable submicron structures with optical stepper lithography and nanometer size structures using electron beam lithography. Improved resolution, repeatability and lower defect count from optical stepper system. Advanced optical, electronic and sensor structures enabled with electron beam lithography.
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This is early/mid-stage (TRL 3) — the most realistic path in is NASA SBIR/STTR, which funds small businesses and research institutions to develop technology aligned with NASA's needs (equity-free, phased funding). Check whether a current SBIR/STTR solicitation topic overlaps with this project's technology area, or contact the project directly (above) to ask.
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