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Fabrication of Partially Transparent Petaled Masks Using Gray Scale Lithography

Completed TRL 3 (started at 2, targeting 3)

Description

In this study we intend to fabricate partially transparent petal (PTP) masks using gray scale lithography on high-energy beam sensitive (HEBS) glass and evaluate its performance in on-going light suppression experiments at Goddard. Preliminary laboratory results from traditional lithography fabricated masks and our published mathematical analyses show PTP masks using gray scale lithography could achieve superior light suppression along the optical axis not obtainable with binary petaled masks. The fabrication process involving low cost gray scale lithography would enable NASA to assess the feasibility of this technology as a means of achieving 3D micro/nano fabrication processes for future device manufacturing.

Our main objective in this study is to design, fabricate, and analyze the partially transparent petaled (PTP) masks using gray scale lithography to suppress the diffracted light along the optical axis of secondary mirror of the New Space-based Gravitational-wave Observatory (NGO) telescope.

Benefits

Suppression of reflected light at the optical axis of secondary mirror of space telescope

Wideband coronography mask for suppression of light intensity at transmission region

 

 

 

Details

Technology areaSensors and Instruments > Observatories > Mirror Systems
ProgramCenter Independent Research & Development: GSFC IRAD (GSFC IRAD)
Lead organizationGoddard Space Flight Center, Greenbelt, MD
Start date2013-10-01
End date2015-09-01

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