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Advanced Lithography to Maximize Performance of Wafer-thin Integrated Photonic Spectrographs, Year 1

Completed TRL 3 (started at 2, targeting 3)

Description

Miniaturize by leverage compact commercial photonic technologies (direct write lithography and optimal input tapers in SiN).

Benefits

Develop Integrated Photonic Spectrographs improve throughput from 25% to >70% over >400 nm bands around 1500 nm, enabling future NASA science missions ranging from visible to SWIR.

Details

Technology areaSensors and Instruments > Remote Sensing Instruments and Sensors
ProgramCenter Innovation Fund: JPL CIF (JPL CIF)
Lead organizationJet Propulsion Laboratory, Pasadena, CA
Start date2020-10-01
End date2021-09-30

Project contacts

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How to get involved

This is early/mid-stage (TRL 3) — the most realistic path in is NASA SBIR/STTR, which funds small businesses and research institutions to develop technology aligned with NASA's needs (equity-free, phased funding). Check whether a current SBIR/STTR solicitation topic overlaps with this project's technology area, or contact the project directly (above) to ask.

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